This paper presents the properties of compounds of molybdenum silicide Mo - Si. The molybdenum layer was formed with a thickness of 1 ÷ 2 μm by magnetron sputtering onto the surface of a semiconductor from a silicon single crystal grown by the Czochralski method in an atmosphere of pure inert argon gas. The properties of molybdenum silicide formed in the volume of silicon have been studied.
Sh.B. Utamuraova , N.A. Turgunov , S.A. Muzafarova , K.M. Fayzullaev, STRUCTURAL STUDIES OF FILMS CADMIUM TELLURIDE GROWN ON SILICON SUBSTRATES , American Journal Of Applied Science And Technology: Vol. 2 No. 09 (2022): Volume02 Issue09
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